I-SiO2 Thin Film Thermal Oxide Silicon wafer 4inch 6inch 8inch 12inch

Incazelo emfushane:

Singahlinzeka nge-substrate yefilimu encane eqhuba ukushisa okuphezulu, amafilimu amancane amagnetic kanye ne-substrate yefilimu encane ye-ferroelectric, ikristalu ye-semiconductor, ikristalu ye-optical, izinto zekristalu ye-laser, ngasikhathi sinye sinikeze ukuqondiswa kanye namanyuvesi angaphandle kanye nezikhungo zocwaningo ukuhlinzeka ngekhwalithi ephezulu (okubushelelezi kakhulu, okubushelelezi kakhulu, okuhlanzekile kakhulu)


Izici

Ukwethulwa kwebhokisi le-wafer

Inqubo eyinhloko yokukhiqiza ama-wafer e-silicon axutshwe ne-oxidized ngokuvamile ihlanganisa izinyathelo ezilandelayo: ukukhula kwe-silicon e-monocrystalline, ukusika ama-wafer abe ama-wafer, ukupholisha, ukuhlanza kanye ne-oxidation.

Ukukhula kwe-silicon e-monocrystalline: Okokuqala, i-silicon e-monocrystalline ikhuliswa emazingeni okushisa aphezulu ngezindlela ezifana nendlela ye-Czochralski noma indlela ye-Float-zone. Le ndlela ivumela ukulungiswa kwamakristalu e-silicon angawodwa ngobumsulwa obuphezulu kanye nobuqotho be-lattice.

Ukusika: I-silicon e-monocrystalline ekhulile ivame ukuba sesimweni esiyisilinda futhi idinga ukunqunywa ibe ama-wafer amancane ukuze isetshenziswe njenge-substrate ye-wafer. Ukusika kuvame ukwenziwa ngomshini wokusika idayimane.

Ukupholisha: Ubuso be-wafer esikiwe bungase bungalingani futhi budinga ukupholisha ngamakhemikhali ukuze kutholakale ubuso obubushelelezi.

Ukuhlanza: I-wafer epholishiwe iyahlanzwa ukuze kususwe ukungcola nothuli.

Ukufaka i-oxidizing: Okokugcina, ama-wafer e-silicon afakwa esithandweni sokushisa okuphezulu ukuze aphathwe nge-oxidizing ukuze akhe ungqimba oluvikelayo lwe-silicon dioxide ukuze kuthuthukiswe izakhiwo zayo zikagesi kanye namandla omshini, kanye nokusebenza njengengqimba yokuvikela kumasekethe ahlanganisiwe.

Ukusetshenziswa okuyinhloko kwama-wafer e-silicon ahlanganisiwe kufaka phakathi ukwenziwa kwamasekethe ahlanganisiwe, ukwenziwa kwamaseli elanga, kanye nokukhiqizwa kwamanye amadivayisi kagesi. Ama-wafer e-silicon oxide asetshenziswa kabanzi emkhakheni wezinto ze-semiconductor ngenxa yezakhiwo zawo ezinhle kakhulu zemishini, ukuzinza kobukhulu kanye namakhemikhali, ikhono lokusebenza emazingeni okushisa aphezulu kanye nokucindezela okuphezulu, kanye nezakhiwo ezinhle zokuvimbela ukushisa kanye nokukhanya.

Izinzuzo zayo zifaka phakathi isakhiwo sekristalu esiphelele, ukwakheka kwamakhemikhali amsulwa, ubukhulu obuqondile, izakhiwo ezinhle zemishini, njll. Lezi zici zenza ama-wafer e-silicon oxide afaneleke kakhulu ekukhiqizweni kwamasekethe ahlanganisiwe asebenza kahle kakhulu kanye namanye amadivayisi e-microelectronic.

Umdwebo Oningiliziwe

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