I-Dia300x1.0mmt Ubukhulu be-Sapphire Wafer C-Plane SSP/DSP
Ukwethulwa kwebhokisi le-wafer
| Izinto Zekristalu | 99,999% we-Al2O3, Ubumsulwa Obuphezulu, i-Monocrystalline, i-Al2O3 | |||
| Ikhwalithi yekristalu | Izinto ezifakiwe, izimpawu zamabhulokhi, amawele, umbala, amabhamuza amancane kanye nezikhungo zokuhlakazeka azikho | |||
| Ububanzi | 2intshi | 3intshi | 4intshi | Amasentimitha angu-6 ~ Amasentimitha angu-12 |
| 50.8± 0.1mm | 76.2±0.2mm | 100±0.3mm | Ngokuhambisana nezinhlinzeko zokukhiqiza okujwayelekile | |
| Ubukhulu | 430±15µm | 550±15µm | 650±20µm | Kungenziwa ngezifiso yikhasimende |
| Ukuqondiswa | Indiza engu-C (0001) kuya ku-M-plane (1-100) noma indiza engu-A(1 1-2 0) 0.2±0.1° /0.3±0.1°, indiza engu-R (1-1 0 2), indiza engu-A (1 1-2 0), indiza engu-M(1-1 0 0), Noma yikuphi ukuqondiswa, Noma yiliphi i-engeli | |||
| Ubude obuyisicaba obuyinhloko | 16.0±1mm | 22.0±1.0mm | 32.5±1.5 mm | Ngokuhambisana nezinhlinzeko zokukhiqiza okujwayelekile |
| Ukuma okuqondile okuyisisekelo | Indiza engu-A (1 1-2 0) ± 0.2° | |||
| I-TTV | ≤10µm | ≤15µm | ≤20µm | ≤30µm |
| I-LTV | ≤10µm | ≤15µm | ≤20µm | ≤30µm |
| I-TIR | ≤10µm | ≤15µm | ≤20µm | ≤30µm |
| UKUGOBHOZA | ≤10µm | ≤15µm | ≤20µm | ≤30µm |
| I-Warp | ≤10µm | ≤15µm | ≤20µm | ≤30µm |
| Ubuso Bangaphambili | I-Epi-Polished (Ra< 0.2nm) | |||
*Umnsalo: Ukuphambuka kwephuzu eliphakathi nendawo eliphakathi kwe-wafer ekhululekile, engabanjwanga kusuka endaweni yokubhekisela, lapho indawo yokubhekisela ichazwa khona ngamakhona amathathu kanxantathu olinganayo.
*I-Warp: Umehluko phakathi kwamabanga aphezulu naphansi obubanzi obuphakathi nendawo ye-wafer ekhululekile, engaboshiwe kusuka endaweni yokubhekisela echazwe ngenhla.
Imikhiqizo nezinsizakalo ezisezingeni eliphezulu zamadivayisi e-semiconductor esizukulwane esilandelayo kanye nokukhula kwe-epitaxial:
Izinga eliphezulu lokusicaba (i-TTV elawulwayo, umnsalo, i-warp njll.)
Ukuhlanzwa kwekhwalithi ephezulu (ukungcola okuphansi kwezinhlayiya, ukungcola okuphansi kwensimbi)
Ukubhoboza i-substrate, ukuhlikihla, ukusika, kanye nokupholisha i-backside
Ukunamathiselwa kwedatha efana nokuhlanzeka kanye nesimo se-substrate (ongakukhetha)
Uma unesidingo se-sapphire substrates, sicela ukhululeke ukuxhumana nathi:
iposi:eric@xkh-semitech.com+86 158 0194 2596 /doris@xkh-semitech.com+86 187 0175 6522
Sizobuyela kuwe ngokushesha okukhulu!
Umdwebo Oningiliziwe





