I-6inch 150mm Silicon Carbide SiC Wafers 4H-N uhlobo lwe-MOS noma i-SBD Production Research kanye nebanga le-Dummy
Izinkambu Zokusebenza
I-6-inch silicon carbide single crystal substrate idlala indima ebalulekile ezimbonini eziningi. Okokuqala, isetshenziswa kakhulu embonini ye-semiconductor ekwenzeni izinto zikagesi ezinamandla amakhulu njengama-transistors, amasekethe ahlanganisiwe, namamojula wamandla. I-conductivity yayo ephezulu ye-thermal kanye nokumelana nokushisa okuphezulu kwenza ukuchithwa okungcono kokushisa, okuholela ekusebenzeni okuthuthukisiwe nokuthembeka. Okwesibili, ama-wafers e-silicon carbide abalulekile emikhakheni yocwaningo ukuze kuthuthukiswe izinto ezintsha namadivayisi. Ukwengeza, i-silicon carbide wafer ithola ukusetshenziswa okubanzi emkhakheni we-optoelectronics, okuhlanganisa ukukhiqizwa kwama-LED nama-laser diode.
Imininingwane Yomkhiqizo
I-6-inch silicon carbide single crystal substrate inobubanzi obungama-intshi angu-6 (cishe u-152.4 mm). Ubukhulu obungaphezulu bungu-Ra <0.5 nm, futhi ukujiya kungu-600 ± 25 μm. I-substrate ingenziwa ngokwezifiso ngohlobo lwe-N noma uhlobo lwe-P, ngokuya ngezidingo zamakhasimende. Ngaphezu kwalokho, ikhombisa ukuzinza kwemishini, ekwazi ukumelana nengcindezi nokudlidliza.
Ububanzi | 150±2.0mm (6inch) | ||||
Ubukhulu | 350 μm±25μm | ||||
Ukuqondisa | Ku-eksisi : <0001>±0.5° | Ku-axis evaliwe:4.0° ukuya ku-1120±0.5° | |||
I-Polytype | 4H | ||||
Ukungazweli(Ω·cm) | 4H-N | 0.015~0.028 Ω·cm/0.015~0.025ohm·cm | |||
4/6H-SI | >1E5 | ||||
Umumo oyisicaba oyinhloko | {10-10}±5.0° | ||||
Ubude obuyisisekelo obuyisicaba (mm) | 47.5 mm±2.5 mm | ||||
Umphetho | I-Chamfer | ||||
I-TTV/Umnsalo/I-Warp (um) | ≤15 /≤40 /≤60 | ||||
I-AFM Front (Si-face) | I-Polish Ra≤1 nm | ||||
I-CMP Ra≤0.5 nm | |||||
I-LTV | ≤3μm(10mm*10mm) | ≤5μm(10mm*10mm) | ≤10μm(10mm*10mm) | ||
I-TTV | ≤5μm | ≤10μm | ≤15μm | ||
Ikhasi eliwolintshi/imigodi/imifantu/ukungcola/amabala/ama-striations | Lutho | Lutho | Lutho | ||
ama-indenti | Lutho | Lutho | Lutho |
I-6-inch silicon carbide single crystal substrate iyinto esebenza kahle kakhulu esetshenziswa kakhulu kuzimboni zesemiconductor, ucwaningo, kanye ne-optoelectronics. Inikeza ukuqhutshwa kwe-thermal okuhle kakhulu, ukuzinza kwemishini, nokumelana nezinga lokushisa eliphezulu, okwenza ifaneleke ukwakhiwa kwemishini ye-elekthronikhi enamandla amakhulu kanye nocwaningo lwezinto ezintsha. Sihlinzeka ngemininingwane ehlukahlukene kanye nezinketho zokwenza ngendlela oyifisayo ukuhlangabezana nezidingo ezahlukahlukene zamakhasimende.Xhumana nathi ukuze uthole imininingwane eyengeziwe ngama-wafers e-silicon carbide!