I-wafer ye-SiC yohlobo lwe-P engu-4H/6H-P 3C-N ubukhulu obuyi-6inch obungu-350 μm obune-Primieration Flat Eyinhloko
Imininingwane4H/6H-P Uhlobo lwe-SiC Composite Substrates Ithebula lamapharamitha avamile
6 I-substrate ye-Silicon Carbide (SiC) ububanzi be-intshi Imininingwane
| Ibanga | Ukukhiqizwa kwe-MPD okungekhoIbanga (Z) Ibanga) | Ukukhiqizwa OkujwayelekileIbanga (P) Ibanga) | Ibanga Eliyimbumbulu (D Ibanga) | ||
| Ububanzi | 145.5 mm ~ 150.0 mm | ||||
| Ubukhulu | 350 μm ± 25 μm | ||||
| Ukuqondiswa kwe-Wafer | -Offi-axis: 2.0°-4.0°ukuya ku-[1120] ± 0.5° ye-4H/6H-P, Ku-axis:〈111〉± 0.5° ye-3C-N | ||||
| Ubuningi be-Micropipe | 0 cm-2 | ||||
| Ukumelana | uhlobo lwe-p 4H/6H-P | ≤0.1 Ωꞏcm | ≤0.3 Ωꞏcm | ||
| uhlobo lwe-n 3C-N | ≤0.8 mΩꞏcm | ≤1 m Ωꞏcm | |||
| Ukuqondiswa Okuyisisekelo Okuyisicaba | 4H/6H-P | -{1010} ± 5.0° | |||
| 3C-N | -{110} ± 5.0° | ||||
| Ubude Obuphansi Obuyinhloko | 32.5 mm ± 2.0 mm | ||||
| Ubude Besibili Obuyisicaba | 18.0 mm ± 2.0 mm | ||||
| Ukuqondiswa Kwesibili Okuyisicaba | I-silicon ibheke phezulu: 90° CW. kusuka ku-Prime flat ± 5.0° | ||||
| Ukukhishwa Komphetho | 3 mm | 6 mm | |||
| I-LTV/TTV/Umnsalo/I-Warp | ≤2.5 μm/≤5 μm/≤15 μm/≤30 μm | ≤10 μm/≤15 μm/≤25 μm/≤40 μm | |||
| Ubulukhuni | I-Polish Ra≤1 nm | ||||
| I-CMP Ra≤0.2 nm | Ra≤0.5 nm | ||||
| Imifantu Yomphetho Ngokukhanya Okunamandla Okuphezulu | Akukho | Ubude obuhlanganisiwe ≤ 10 mm, ubude obubodwa ≤2 mm | |||
| Amapuleti e-Hex Ngokukhanya Okuphezulu | Indawo eqongelelayo ≤0.05% | Indawo ehlanganisiwe ≤0.1% | |||
| Izindawo ze-Polytype Ngokukhanya Okunamandla Okuphezulu | Akukho | Indawo eqongelelekayo ≤3% | |||
| Ukufakwa kwekhabhoni ebonakalayo | Indawo eqongelelayo ≤0.05% | Indawo eqongelelayo ≤3% | |||
| Ukuklwebheka Komphezulu We-Silicon Ngokukhanya Okunamandla Okuphezulu | Akukho | Ubude obuhlanganisiwe ≤1 × ububanzi be-wafer | |||
| Ama-Edge Chips Aphezulu Ngokukhanya Okunamandla | Akukho okuvunyelwe ububanzi nokujula okungu-≥0.2mm | 5 kuvunyelwe, ≤1 mm ngayinye | |||
| Ukungcoliswa Komphezulu We-Silicon Ngu-High Intensity | Akukho | ||||
| Ukupakisha | Ikhasethi ye-Multi-wafer noma i-Single Wafer | ||||
Amanothi:
※ Imikhawulo yamaphutha isebenza kuyo yonke indawo ye-wafer ngaphandle kwendawo engafakwanga emaphethelweni. # Imihuzuko kufanele ihlolwe ebusweni be-Si o
I-wafer ye-P-type SiC, engu-4H/6H-P 3C-N, enobukhulu bayo obungu-6 intshi kanye nobukhulu obungu-350 μm, idlala indima ebalulekile ekukhiqizweni kwezimboni kwe-electronics yamandla asebenza kahle kakhulu. Ukushisa kwayo okuhle kakhulu kanye ne-voltage ephezulu yokuqhekeka kwenza kube kuhle kakhulu ekukhiqizeni izingxenye ezifana nokushintsha kwamandla, ama-diode, nama-transistors asetshenziswa ezindaweni ezishisa kakhulu njengezimoto zikagesi, amagridi kagesi, kanye nezinhlelo zamandla avuselelekayo. Ikhono le-wafer lokusebenza kahle ezimweni ezinzima liqinisekisa ukusebenza okuthembekile ezisetshenzisweni zezimboni ezidinga amandla amaningi kanye nokusebenza kahle kwamandla. Ngaphezu kwalokho, ukuqondiswa kwayo okuyisisekelo okuyisicaba kusiza ekuhleleni okunembile ngesikhathi sokwenziwa kwedivayisi, ukuthuthukisa ukusebenza kahle kokukhiqiza kanye nokuvumelana komkhiqizo.
Izinzuzo ze-substrates ze-N-type SiC ezihlanganisiwe zifaka phakathi
- Ukushisa Okuphezulu Kokushisa: Ama-wafer e-P-type SiC akhipha ukushisa ngempumelelo, okwenza kube kuhle kakhulu ekusetshenzisweni kwezinga lokushisa eliphezulu.
- I-Voltage Ephezulu Yokuqhekeka: Iyakwazi ukumelana nama-voltage aphezulu, iqinisekisa ukuthembeka kuma-electronics anamandla kanye namadivayisi ane-voltage ephezulu.
- Ukumelana Nezindawo Ezinzima: Ukuqina okuhle kakhulu ezimweni ezimbi kakhulu, njengamazinga okushisa aphezulu kanye nezindawo ezigqwalayo.
- Ukuguqulwa Kwamandla Okusebenzayo: I-doping yohlobo lwe-P yenza kube lula ukuphatha amandla ngendlela ephumelelayo, okwenza i-wafer ifanelekele izinhlelo zokuguqula amandla.
- Ukuqondiswa Okuyisisekelo Okuyisicaba: Iqinisekisa ukuhambisana okunembile ngesikhathi sokukhiqiza, ithuthukisa ukunemba kwedivayisi kanye nokungaguquguquki.
- Isakhiwo Esincane (350 μm): Ubukhulu obuhle be-wafer busekela ukuhlanganiswa kwamadivayisi kagesi athuthukile, anesikhala esincane.
Sekukonke, i-P-type SiC wafer, 4H/6H-P 3C-N, inikeza izinzuzo eziningi ezenza ifaneleke kakhulu ekusetshenzisweni kwezimboni kanye ne-elekthronikhi. Ukushisa kwayo okuphezulu kanye ne-voltage yokuqhekeka kwenza ukusebenza okuthembekile ezindaweni ezinokushisa okuphezulu kanye ne-voltage ephezulu, kuyilapho ukumelana kwayo nezimo ezinzima kuqinisekisa ukuqina. I-P-type doping ivumela ukuguqulwa kwamandla okuphumelelayo, okwenza kube kuhle kakhulu kuma-electronics kagesi kanye nezinhlelo zamandla. Ngaphezu kwalokho, ukuqondiswa okuyisisekelo kwe-wafer kuqinisekisa ukuhambisana okunembile ngesikhathi senqubo yokukhiqiza, okuthuthukisa ukuhambisana kokukhiqiza. Njengoba iwugqinsi olungama-350 μm, ifaneleka kahle ukuhlanganiswa kumadivayisi athuthukile, aqinile.
Umdwebo Oningiliziwe





