I-HPSI SiC Wafer ≥90% Ibanga Lokukhanya Lokudlulisa Ama-AI/AR
Isingeniso Esiyinhloko: Indima Yama-HPSI SiC Wafers Ezingilazini ze-AI/AR
Ama-wafer e-Silicon Carbide e-HPSI (High-Purity Semi-Insulating) angama-wafer akhethekile abonakala ngokumelana okuphezulu (>10⁹ Ω·cm) kanye nobuningi obuphansi kakhulu bokukhubazeka. Ezingilazini ze-AI/AR, asebenza ngokuyinhloko njengezinto eziyisisekelo zamalensi e-optical waveguide ahlukanisayo, abhekana nezinkinga ezihlobene nezinto zendabuko ze-optical ngokwezinto ezincane nezikhanyayo, ukushabalaliswa kokushisa, kanye nokusebenza kwe-optical. Isibonelo, izibuko ze-AR ezisebenzisa amalensi e-SiC waveguide zingafinyelela insimu yokubuka ebanzi kakhulu (i-FOV) engu-70°–80°, ngenkathi kunciphisa ukujiya kwesendlalelo selensi eyodwa kube ngu-0.55mm kuphela kanye nesisindo sibe ngu-2.7g kuphela, okuthuthukisa kakhulu induduzo yokugqokwa kanye nokucwiliswa okubonakalayo.
Izici Eziyinhloko: Indlela Izinto ze-SiC Ezinika Ngayo Amandla Umklamo Wezingilazi ze-AI/AR
Inkomba Ephakeme Yokubukeza kanye Nokwenza Kahle Ukusebenza Kokubona
- Inkomba yokukhanya ye-SiC (2.6–2.7) iphakeme cishe ngo-50% kuneyengilazi yendabuko (1.8–2.0). Lokhu kuvumela izakhiwo zokuqondisa amagagasi ezincane nezisebenza kahle, okwandisa kakhulu i-FOV. Inkomba yokukhanya ephezulu iyasiza futhi ekucindezeleni "umphumela wothingo" ovamile kuma-waveguide ahlukanisayo, okuthuthukisa ubumsulwa besithombe.
Amandla Okuphatha Okushisayo Angavamile
- Njengoba i-thermal conductivity ifinyelela ku-490 W/m·K (esondele kweyethusi), i-SiC ingasusa ngokushesha ukushisa okukhiqizwa amamojula okubonisa e-Micro-LED. Lokhu kuvimbela ukwehla kokusebenza noma ukuguga kwedivayisi ngenxa yokushisa okuphezulu, okuqinisekisa impilo yebhethri ende kanye nokuqina okuphezulu.
Amandla Okusebenza Nokuqina Kwemishini
- I-SiC inobulukhuni buka-Mohs obungu-9.5 (obulandela idayimane kuphela), inikeza ukumelana nokuklwebheka okumangalisayo, okwenza ifaneleke kakhulu ezingilazini ezisetshenziswa njalo. Ubulukhuni bayo bomphezulu bungalawulwa ku-Ra < 0.5 nm, ukuqinisekisa ukulahleka okuncane kanye nokudluliselwa kokukhanya okufanayo kakhulu kuma-waveguides.
Ukuhambisana Kwempahla Kagesi
- Ukumelana kwe-HPSI SiC (>10⁹ Ω·cm) kusiza ukuvimbela ukuphazamiseka kwesignali. Kungasebenza futhi njengento yedivayisi yamandla esebenza kahle, kuthuthukisa amamojula okuphatha amandla ezingilazini ze-AR.
Iziqondiso Zokusebenza Eziyinhloko
Izingxenye Eziyinhloko Zokukhanya ze-AI/AR Glasses
- Amalensi e-Diffractive Waveguide: Ama-substrate e-SiC asetshenziselwa ukudala ama-waveguide e-optical aqine kakhulu asekela i-FOV enkulu kanye nokususwa komphumela we-rainbow.
- Amapuleti Nama-Prism Efasiteleni: Ngokusika nokupholisha okwenziwe ngokwezifiso, i-SiC ingacutshungulwa ibe amafasitela avikelayo noma ama-prism e-optical ezibuko ze-AR, okuthuthukisa ukuhanjiswa kokukhanya kanye nokumelana nokuguguleka.
Izicelo Ezandisiwe Kwezinye Izinkambu
- Amandla kagesi: Asetshenziswa ezimweni ezivame kakhulu nezinamandla aphezulu njengeziguquli zezimoto ezintsha zamandla kanye nezilawuli zezimoto zezimboni.
- I-Quantum Optics: Isebenza njengomsingathi wezikhungo zombala, esetshenziswa kuma-substrates okuxhumana kwe-quantum kanye namadivayisi okuzwa.
Ukuqhathanisa Imininingwane Ye-HPSI SiC Substrate Engama-intshi angu-4 kanye nama-intshi angu-6
| Ipharamitha | Ibanga | I-Substrate engu-4-intshi | I-Substrate engu-6-intshi |
| Ububanzi | Ibanga lika-Z / Ibanga lika-D | 99.5 mm - 100.0 mm | 149.5 mm - 150.0 mm |
| Uhlobo lwe-poly | Ibanga lika-Z / Ibanga lika-D | 4H | 4H |
| Ubukhulu | Ibanga lika-Z | 500 μm ± 15 μm | 500 μm ± 15 μm |
| Ibanga lika-D | 500 μm ± 25 μm | 500 μm ± 25 μm | |
| Ukuqondiswa kwe-Wafer | Ibanga lika-Z / Ibanga lika-D | Ku-axis: <0001> ± 0.5° | Ku-axis: <0001> ± 0.5° |
| Ubuningi be-Micropipe | Ibanga lika-Z | ≤ 1 cm² | ≤ 1 cm² |
| Ibanga lika-D | ≤ 15 cm² | ≤ 15 cm² | |
| Ukumelana | Ibanga lika-Z | ≥ 1E10 Ω·cm | ≥ 1E10 Ω·cm |
| Ibanga lika-D | ≥ 1E5 Ω·cm | ≥ 1E5 Ω·cm | |
| Ukuqondiswa Okuyisisekelo Okuyisicaba | Ibanga lika-Z / Ibanga lika-D | (10-10) ± 5.0° | (10-10) ± 5.0° |
| Ubude obuyisisekelo obuyisicaba | Ibanga lika-Z / Ibanga lika-D | 32.5 mm ± 2.0 mm | I-Notch |
| Ubude Besibili Besicaba | Ibanga lika-Z / Ibanga lika-D | 18.0 mm ± 2.0 mm | - |
| Ukukhishwa Kwemiphetho | Ibanga lika-Z / Ibanga lika-D | 3 mm | 3 mm |
| I-LTV / TTV / Umnsalo / I-Warp | Ibanga lika-Z | ≤ 2.5 μm / ≤ 5 μm / ≤ 15 μm / ≤ 30 μm | ≤ 2.5 μm / ≤ 6 μm / ≤ 25 μm / ≤ 35 μm |
| Ibanga lika-D | ≤ 10 μm / ≤ 15 μm / ≤ 25 μm / ≤ 40 μm | ≤ 5 μm / ≤ 15 μm / ≤ 40 μm / ≤ 80 μm | |
| Ubulukhuni | Ibanga lika-Z | I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm | I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm |
| Ibanga lika-D | I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.2 nm | I-Polish Ra ≤ 1 nm / CMP Ra ≤ 0.5 nm | |
| Ama-Edge Cracks | Ibanga lika-D | Indawo ehlanganisiwe ≤ 0.1% | Ubude obuhlanganisiwe ≤ 20 mm, obubodwa ≤ 2 mm |
| Izindawo ze-Polytype | Ibanga lika-D | Indawo ehlanganisiwe ≤ 0.3% | Indawo eqongelelekayo ≤ 3% |
| Ukufakwa kwe-Visual Carbon | Ibanga lika-Z | Indawo eqongelelekayo ≤ 0.05% | Indawo eqongelelekayo ≤ 0.05% |
| Ibanga lika-D | Indawo ehlanganisiwe ≤ 0.3% | Indawo eqongelelekayo ≤ 3% | |
| Ukuklwebheka Okungaphezulu Kwe-Silicon | Ibanga lika-D | 5 kuvunyelwe, ngayinye ≤1mm | Ubude obuhlanganisiwe ≤ 1 x ububanzi |
| Ama-Edge Chips | Ibanga lika-Z | Akukho okuvunyelwe (ububanzi nokujula ≥0.2mm) | Akukho okuvunyelwe (ububanzi nokujula ≥0.2mm) |
| Ibanga lika-D | 7 kuvunyelwe, ngayinye ≤1mm | 7 kuvunyelwe, ngayinye ≤1mm | |
| Ukuhlukaniswa Kwesikulufa Sokusonta | Ibanga lika-Z | - | ≤ 500 cm² |
| Ukupakishwa | Ibanga lika-Z / Ibanga lika-D | Ikhasethi Yesitsha Esinezitsha Eziningi Noma Isitsha Esilodwa Sesitsha Esinezitsha Ezincane | Ikhasethi Yesitsha Esinezitsha Eziningi Noma Isitsha Esilodwa Sesitsha Esinezitsha Ezincane |
Izinsizakalo ze-XKH: Amandla Okukhiqiza Nokwenza Ngokwezifiso Ahlanganisiwe
Inkampani ye-XKH inamakhono okuhlanganisa aqondile kusukela ezintweni zokusetshenziswa kuya kuma-wafer aqediwe, amboza lonke uchungechunge lokukhula kwe-substrate ye-SiC, ukusika, ukupholisha, kanye nokucutshungulwa ngokwezifiso. Izinzuzo ezibalulekile zesevisi zifaka:
- Ukuhlukahluka Kwezinto Ezibonakalayo:Singahlinzeka ngezinhlobo ezahlukene ze-wafer njengohlobo lwe-4H-N, uhlobo lwe-4H-HPSI, uhlobo lwe-4H/6H-P, kanye nohlobo lwe-3C-N. Ukumelana, ukujiya, kanye nokuma kungalungiswa ngokuya ngezimfuneko.
- .Ukwenza Ngokwezifiso Usayizi Oguquguqukayo:Sisekela ukucutshungulwa kwe-wafer kusukela kububanzi obungu-2 intshi kuya ku-12 intshi, futhi singacubungula nezakhiwo ezikhethekile njengezingcezu zesikwele (isb., 5x5mm, 10x10mm) kanye nama-prism angajwayelekile.
- Ukulawula Ukuchaneka Kwezinga Lokukhanya:I-Wafer Total Thickness Variation (TTV) ingagcinwa ku-<1μm, kanye nokungaguquguquki kwendawo ku-Ra < 0.3 nm, okuhlangabezana nezidingo ze-nano-level flatness zamadivayisi e-waveguide.
- Impendulo Esheshayo Yemakethe:Imodeli yebhizinisi ehlanganisiwe iqinisekisa ukuguquka okuphumelelayo kusuka ku-R&D kuya ekukhiqizweni okukhulu, okusekela konke kusukela ekuqinisekisweni kweqembu elincane kuya ekuthunyelweni okukhulu (isikhathi sokuhola ngokuvamile siyizinsuku ezingu-15-40).

Imibuzo Evame Ukubuzwa ye-HPSI SiC Wafer
Umbuzo 1: Kungani i-HPSI SiC ibhekwa njengento efanelekile yamalensi e-AR waveguide?
A1: Inkomba yayo ephezulu yokubuka (2.6–2.7) ivumela izakhiwo ezincane nezisebenza kahle zamagagasi ezisekela insimu enkulu yokubuka (isb., 70°–80°) ngenkathi kususwa "umphumela wothingo".
Umbuzo 2: I-HPSI SiC ithuthukisa kanjani ukuphathwa kokushisa ezingilazini ze-AI/AR?
A2: Njengoba ikwazi ukudlulisa ukushisa kufika ku-490 W/m·K (eseduze nethusi), isusa ukushisa kahle ezingxenyeni ezifana nama-Micro-LED, iqinisekisa ukusebenza okuzinzile kanye nokuphila isikhathi eside kwedivayisi.
Q3: Yiziphi izinzuzo zokuqina ezinikezwa yi-HPSI SiC ngezibuko ezigqokwayo?
A3: Ubulukhuni bayo obungavamile (Mohs 9.5) bunikeza ukumelana okuhle kokuklwebheka, okwenza iqine kakhulu ukusetshenziswa nsuku zonke ezingilazini ze-AR ezisezingeni labathengi.













