Ngokwezifiso I-Sapphire Optical Windows High Purity Transmittance ≥90%
Imingcele yezobuchwepheshe
Into | Iwindi le-Optical |
Okubalulekile | BK7, JGS1, UV Fused Silica, Sapphire njll |
Ubukhulu | 1mm-300mm |
Ukubekezelelana kobukhulu | ±0.05mm |
Ikhwalithi yobuso | 20-10~60-40 |
Ubucaba bobuso | 1/4~1/8 |
Imbobo ecacile | ngaphezu kuka-90% |
Ukugqoka | 200-4000nm |
Isicelo | I-Laser, ukudlulisa ukukhanya, isibonisi, njll. |
Izimpawu Ezisemqoka
1.I-Extreme Environment Ukuguquguquka
Amawindi okukhanya kwe-Sapphire abonisa ukusebenza okukhethekile nendawo encibilikayo engu-2053°C, egcina ubuqotho besakhiwo ezindaweni zokusebenza eziqhubekayo ezingu-1000°C. Lokhu kuzinza kwe-thermal kunikwe amandla i-ultra-low coefficient of thermal expansion (CTE) engu-5.3×10⁻⁶/K eduze kwe-C-axis, iphakeme kakhulu kunezingilazi ezibonakalayo ezivamile. Ngokwekhemikhali, amafasitela okukhanya kwesafire abonisa ukungabi nalutho okuphawulekayo, amelana nawo wonke ama-asidi aqinile (ngaphandle kwe-HF) nama-alkali, awenza alungele imishini yokucubungula amakhemikhali nezinhlelo zokusebenza zasolwandle. Ngomshini, lawa mawindi aqhosha ngamandla aguquguqukayo adlula i-1000MPa (izikhathi ezi-5-8 ezinamandla kunengilazi evamile yokubona) enokumelana nomthelela ovelele.
2.Optical Performance Izinzuzo
Amafasitela abonakalayo weSapphire ahlinzeka >80% wokudlulisela kulo lonke uhla lwe-spectral olubanzi (200-5500nm at 2mm ukujiya). Ngokuqondisa okulungiselelwe kwekristalu (isb, i-C-axis perpendicular to light), imiphumela ye-birefringence incishiswa ngempumelelo. Ikhwalithi yobuso ihlangabezana nezidingo eziqinile zokubona nge-λ/10 flatness ku-633nm kanye nobulukhuni bobuso obungu-<0.5nm RMS.
3.Amakhono Athuthukile Okukhiqiza
Amawindi ethu okukhanya kwesafire asekela ukucutshungulwa kwefomethi enkulu (>300mm ububanzi) namajiyometri ayinkimbinkimbi afaka ukucushwa kwe-aspheric kanye nezitebhisi. Ubuchwepheshe bokuvalwa okukhethekile buzuza amanani okuvuza <1×10⁻⁹Pa·m³/s ngezinhlelo ze-vacuum. Ngezimbotshana zekhabhoni efana nedayimane (i-DLC), i-laser-induced damage threshold (LIDT) ifinyelela ku-15J/cm² (1064nm, 10ns pulses).
Izicelo Eziyinhloko
1.Izokuvikela kanye ne-Aerospace
Amafasitela abonakalayo e-Sapphire asebenza njengama-missile domes, amelana nokushaqeka okushisayo okudlulele (>1000°C) phakathi nokundiza kwe-hypersonic. Izinhlobonhlobo zebanga lomkhathi ziqinisekisa ngaphezu kweminyaka eyi-15 yempilo yesevisi ye-orbital ezinhlelweni zemikhumbi-mkhathi.
2.Izisetshenziswa zezimboni
Ekwenziweni kwe-semiconductor, amafasitela abona ngesafire asebenza njengezindawo zokubuka ezimelana ne-plasma ku-etch kanye ne-CVD chambers. Ama-endoscopes okushisa okuphezulu asebenzisa lawa mawindi ukuze athwebule izithombe ezicacile ezindaweni zesithando somlilo esingu-1500°C.
3.Izinsimbi Zesayensi
Amawindi abonakalayo esafire anobumsulwa obukhulu (<5ppm ukungcola) anciphisa ukumuncwa kwe-X-ray emigqeni yokukhanya ye-synchrotron. Ukungathembeki kwabo okuphansi kugcina ukwethembeka kwe-femtosecond pulse kumasistimu we-laser asheshayo.
4.Amadivayisi Ezentengiso
Izinto ezingaphansi kolwandle ezijulile zisebenzisa amawindi okukhanya kwesafire alinganiselwe ukushona okungu-6000m (>60MPa). Amakhamera omakhalekhukhwini ahlanganisa lawa mawindi njengamakhava okuvikela, asebenzisa ukumelana nokuklwebheka kwawo kwe-Mohs 9 ukuze aqine ukuqina.
Amawindi okukhanya kwe-Sapphire ayaqhubeka nokwandisa izinhlelo zawo zokusebenza ngokuthuthuka ekucutshungulweni kwefomethi enkulu, amajiyometri ayinkimbinkimbi, nezici zokusebenza ezithuthukisiwe, eqinisa isikhundla sazo njengezingxenye ezibalulekile kuzo zonke izimboni zobuchwepheshe obuphezulu.
Izinsizakalo ze-XKH
Inkundla yesevisi ebanzi ye-XKH ihlanganisa ubungcweti bokukhiqiza obusezingeni eliphezulu nokusekelwa okuqinile kobuchwepheshe ukuze ilethe izixazululo zewindi lokukhanya lesafire elingena ekupheleni. Isigaba sokukhiqiza ngokwezifiso sinikeza ukucubungula okusekelwe kumdwebo onekhono eligcwele lokuguqula ifayela le-2D/3D, elihambisana nezinsizakalo zokuthuthukisa i-Design for Manufacturing (DFM) ezinciphisa ubungozi bokukhiqiza nezindleko. Sigcina amakhono ahamba phambili embonini okwenza i-prototyping, siletha amasampula asebenzayo angu-Φ100mm phakathi nezinsuku zebhizinisi ezingu-5 ukusheshisa imijikelezo yokuthuthukiswa komkhiqizo. Ukwelashwa okuthuthukisiwe okusebenzayo kufaka phakathi ukunemba kwezingubo zokuqondisa ezinokumelana neshidi okuguqulekayo kusuka ku-10-1000Ω/ □ kuzinhlelo zokusebenza zokuvikela i-EMI, kanye namafilimu obunikazi amelene nenkungu agcina ukucaca kokubonakalayo ezindaweni ezinomswakama ophezulu.
Ingqalasizinda yosekelo lwezobuchwepheshe ihlanganisa ithimba lonjiniyela elizinikele elisebenzisa isofthiwe yokulingisa i-Zemax ne-CodeV ukuze ibonise ukusebenza kwesistimu nokubikezela ukuziphatha okushisayo/ komshini ngaphansi kwezimo zokusebenza. Ilabhorethri yethu yokuxilongwa kwezinto ezibonakalayo, efakwe i-electron microscopy (SEM) yokuskena kanye ne-X-ray spectroscopy (EDS), ihlinzeka ngokuhlaziywa kokwehluleka kwezimpande ukuze kuthuthukiswe ukwethembeka. Izinsizakalo zokuqinisekisa indawo ezungezile zibandakanya ukuhlola okushisayo kwamabhayisikili okushisayo (-196 ℃ kuya ku-800 ℃) kanye nokuchayeka kwesifutho sikasawoti samahora angu-500 ngamazinga e-MIL-STD-810G, okuqinisekisa ukuqina kwengxenye ezimeni zokusebenza ezinzima.
Amasistimu okuqinisekisa ikhwalithi asebenzisa ukulandeleka okugcwele kwempahla kusukela ku-crystal boule kuya kumkhiqizo osuphelile, ingxenye ngayinye ihambisana nemibhalo yesitifiketi esiphelele. Amandla we-metrology esezingeni eliphezulu ahlanganisa i-interferometry yesigaba se-4D yokuguqulwa kwesigaba esingu-λ/50 sokuqinisekisa ukunemba kwendawo, i-interferometry yokukhanya okumhlophe efinyelela ukuxazululeka kobuso obungu-0.1nm, kanye nokuhlaziywa kwe-spectrophotometric okumboza ububanzi be-spectral obungu-190-3300nm ukuze kudluliselwe ukulinganisa/ukubonakaliswa kwezinhlamvu.
Amasevisi e-value-added abhekana nezidingo zezicelo ezikhethekile, okuhlanganisa izixazululo zokuhlanganisa i-vacuum enemiphetho eyenziwe ngensimbi ene-hermetic brazing yezinhlelo ze-ultra-high vacuum (UHV). Amasevisi okulawula i-Electrostatic discharge (ESD) ahlanganisa ukumelana kwendawo phakathi kuka-10⁶-10⁹Ω ukuze kuvinjelwe ukunqwabelana kweshaji kumathuluzi azwelayo. Zonke izingxenye zifakwa emaphaketheni okokugcina ezindaweni zegumbi elihlanzekile Lekilasi le-100, ngokubala kwezinhlayiyana ozikhethela zona kanye nokupakishwa okubhakwe nge-vacuum ngezidingo zokuhlanzeka kwebanga le-semiconductor.

