Uhlolojikelele Oluphelele Lwezindlela Zokufaka Ifilimu Encane: I-MOCVD, i-Magnetron Sputtering, ne-PECVD

Ekwenziweni kwe-semiconductor, kuyilapho i-photolithography kanye ne-etching kuyizinqubo ezishiwo kakhulu, amasu e-epitaxial noma ama-filimi azacile abaluleke ngokufanayo. Lesi sihloko sethula izindlela ezimbalwa ezijwayelekile zokubeka ifilimu emincane esetshenziswa ekwenzeni ama-chip, okuhlanganisaI-MOCVD, i-magnetron sputtering, futhiI-PECVD.

Kungani Izinqubo Zamafilimu Amancane Zibalulekile Ekwenziweni Kwe-Chip?

Ngokwesibonelo, ake ucabange ngesinkwa esiyisicaba esibhakiwe. Ngokwayo, ingase inambithe kalula. Nokho, ngokuxubha indawo engaphezulu ngamasoso ahlukene—njengokunamathisela kabhontshisi oswidi noma isiraphu enoshukela—ungawushintsha ngokuphelele ukunambitheka kwawo. Lezi zingubo ezithuthukisa ukunambitheka ziyafanaamafilimu amancaneezinqubweni ze-semiconductor, kuyilapho isinkwa esiyisicaba ngokwaso simelelai-substrate.

Ekwenziweni kwama-chip, amafilimu amancanyana asebenza izindima eziningi ezisebenzayo-ukufakwa kwe-insulation, conductivity, passivation, ukumuncwa ukukhanya, njll-futhi umsebenzi ngamunye udinga indlela ethile yokubeka.

1. I-Metal-Organic Chemical Vapor Deposition (MOCVD)

I-MOCVD iyindlela ethuthuke kakhulu nenembayo esetshenziselwa ukubekwa kwamafilimu nama-nanostructures asezingeni eliphezulu we-semiconductor. Idlala indima ebalulekile ekwakhiweni kwamadivayisi afana nama-LED, ama-laser, namandla kagesi.

Izingxenye Ezibalulekile Zohlelo lwe-MOCVD:

• I-Gas Delivery System
  Unomthwalo wemfanelo wokwethulwa okunembayo kwama-reactants ekamelweni lokusabela. Lokhu kubandakanya ukulawula ukugeleza kwe:

• Amagesi enkampani

• Metal-organic precursors

• Amagesi e-Hydride
  Isistimu inama-valve ezindlela eziningi ukushintsha phakathi kwezindlela zokukhula nokuhlanzwa.

• I-Reaction Chamber
  Inhliziyo yesistimu lapho ukukhula kwezinto ezibonakalayo kwenzeka khona. Izingxenye zihlanganisa:

  • I-graphite susceptor (isibambi se-substrate)

  • Izinzwa zokushisa nezinga lokushisa

  • Izimbobo ezibonakalayo zokuqapha okungaphakathi kwendawo

  • Izingalo zerobhothi zokulayisha/ukulayishwa kwe-wafer okuzenzakalelayo

• Uhlelo Lokulawula Ukukhula
  Iqukethe izilawuli ze-logic ezihlelekayo kanye nekhompuyutha engusokhaya. Lokhu kuqinisekisa ukuqapha okunembile kanye nokuphindaphinda kuyo yonke inqubo yokubeka.

• I-In-situ Monitoring
  Amathuluzi afana nama-pyrometers nama-refleometers alinganisa:

  • Ukujiya kwefilimu

  • Izinga lokushisa elingaphezulu

  • I-substrate curvature
    Lokhu kuvumela impendulo yesikhathi sangempela nokulungiswa.

• I-Exhaust Treatment System
  Yelapha imikhiqizo enobuthi isebenzisa ukubola okushisayo noma i-chemical catalysis ukuze kuqinisekiswe ukuphepha nokuhambisana nemvelo.

Ukucushwa kwe-Caled-Coupled Showerhead (CCS):

Kuma-reactors e-MOCVD aqondile, idizayini ye-CCS ivumela amagesi ukuthi ajovwe ngokufanayo ngokusebenzisa imibhobho eshintshanayo esakhiweni se-showerhead. Lokhu kunciphisa ukusabela ngaphambi kwesikhathi futhi kuthuthukisa ukuxubana okufanayo.

• Ii-graphite susceptor ejikelezayongokuqhubekayo kusiza ukwenza i-homogenize ungqimba lomngcele wamagesi, ukuthuthukisa ukufana kwefilimu kuyo yonke i-wafer.

2. I-Magnetron Sputtering

I-Magnetron sputtering iyindlela ye-physical vapor deposition (PVD) esetshenziswa kabanzi ukuze kufakwe amafilimu amancanyana nama-coatings, ikakhulukazi ku-electronics, optics, kanye ne-ceramics.

Isimiso sokusebenza:

1. Okuqondisiwe
   Izinto eziwumthombo okufanele zifakwe—insimbi, i-oxide, i-nitride, njll—zigxiliswe ku-cathode.

2. Igumbi leVacuum
   Inqubo yenziwa ngaphansi kwe-vacuum ephezulu ukuze kugwenywe ukungcoliswa.

3. Isizukulwane sePlasma
   Igesi ye-inert, ngokuvamile i-argon, i-ionized ukuze yakhe i-plasma.

4. Isicelo Sensimu Yezibuthe
   Inkambu kazibuthe ivalela ama-electron eduze kwalapho okuhlosiwe ukuze kuthuthukiswe ukusebenza kahle kwe-ionization.

5. Inqubo ye-Sputtering
   Ama-ion aqhumisa impoqo, akhiphe ama-athomu ahamba egunjini aphinde afake ku-substrate.

Izinzuzo ze-Magnetron Sputtering:

• I-Uniform Film Depositionezindaweni ezinkulu.

• Ikhono Lokufaka Idiphozithi Complex Compounds, kufaka phakathi ama-alloys nezitsha zobumba.

• Amapharamitha wenqubo e-Tunableukuze uthole ukulawula okunembile kokujiya, ukwakheka, kanye nesakhiwo esincane.

• Ikhwalithi Yefilimu Ephakemengokunamathela okuqinile namandla emishini.

• Ukuhambisana Okubanzi Kwempahla, kusukela ezinsimbi kuya kuma-oxide nama-nitride.

• Ukusebenza Kwezinga Lokushisa Eliphansi, ilungele ama-substrates azwelayo lokushisa.

3. I-Plasma-Enhanced Chemical Vapor Deposition (PECVD)

I-PECVD isetshenziswa kabanzi ekufakweni kwamafilimu amancane njenge-silicon nitride (SiNx), i-silicon dioxide (SiO₂), ne-amorphous silicon.

Isimiso:

Ohlelweni lwe-PECVD, amagesi andulelayo angeniswa ekamelweni le-vacuum lapho ai-plasma yokukhipha ukukhanyaikhiqizwa kusetshenziswa:

• I-RF excitation

• I-DC high voltage

• Imithombo ye-microwave noma ipulsed

I-plasma yenza kusebenze ukusabela kwesigaba segesi, ikhiqize izinhlobo ezisebenzayo ezifaka ku-substrate ukuze zenze ifilimu elincanyana.

Izinyathelo zokubeka:

1. Ukwakhiwa kwePlasma
   Ijatshuliswe izinkambu kazibuthe kagesi, amagesi angaphambili enza i-ionize yakhe ama-radicals asebenzayo nama-ion.

2. Ukusabela kanye Nezokuthutha
   Lezi zinhlobo zithola ukusabela okwesibili njengoba ziya ku-substrate.

3. Ukusabela kobuso
   Lapho befika ku-substrate, bayakhangisa, basabele, futhi bakhe ifilimu eqinile. Eminye imikhiqizo ekhiqizwayo ikhishwa njengamagesi.

Izinzuzo ze-PECVD:

• I-Uniformity enhle kakhuluekubunjweni kwefilimu nokuqina.

• Ukunamathela Okuqinilengisho emazingeni okushisa aphansi uma kuqhathaniswa.

• Amazinga aphezulu okubeka, okwenza ifanelekele ukukhiqizwa kwezimboni.

4. Amasu Okwenza Ifilimu Encane

Ukuqonda izici zamafilimu amancane kubalulekile ekulawuleni ikhwalithi. Amasu ajwayelekile afaka:

(1) I-X-ray Diffraction (XRD)

• Inhloso: Hlaziya izakhiwo zekristalu, ama-lattice constants, nama-orientation.

• Isimiso: Ngokusekelwe emthethweni ka-Bragg, ikala ukuthi ama-X-reyi ahluka kanjani ngento eyikristalu.

• Izinhlelo zokusebenza: I-Crystallography, ukuhlaziywa kwesigaba, ukulinganiswa kobunzima, nokuhlolwa kwefilimu encane.

(2) Iskena i-Electron Microscopy (SEM)

• Inhloso: Qaphela i-surface morphology kanye ne-microstructure.

• Isimiso: Isebenzisa i-electron beam ukuze iskene indawo yesampula. Amasignali atholiwe (isb, ama-electron esibili nama-backscatted) aveza imininingwane yendawo.

• Izinhlelo zokusebenza: Isayensi yezinto ezibonakalayo, i-nanotech, biology, nokuhlaziywa kokwehluleka.

(3) I-Atomic Force Microscopy (AFM)

• Inhloso: Indawo yesithombe ngokulungiswa kwe-athomu noma i-nanometer.

• Isimiso: I-probe ebukhali ihlola indawo ngenkathi igcina amandla okuxhumana angashintshi; ukugudluka okuqondile kudala i-3D topography.

• Izinhlelo zokusebenza: Ucwaningo lwe-Nanostructure, ukukalwa kokuqina komhlaba, izifundo ze-biomolecular.